Boron atoms are added to a Si film resulting in an impurity density of 4 x 10¹6 cm-³. (a) What is the conductivity type (N-type or P-type) of this film? (b) What are the equilibrium electron and hole densities at 300 K and 600 K? (c) Why does the mobile carrier concentration increase at high temperatures? (d) Where is the Fermi level located if T = 600 K?

Boron atoms are added to a Si film resulting in an impurity density of 4 x 10¹6 cm-³. (a) What is the conductivity type (N-type or P-type) of this film? (b) What are the equilibrium electron and hole densities at 300 K and 600 K? (c) Why does the mobile carrier concentration increase at high temperatures? (d) Where is the Fermi level located if T = 600 K?

Modern Physics

3rd Edition

ISBN:9781111794378

Author:Raymond A. Serway, Clement J. Moses, Curt A. Moyer

Publisher:Raymond A. Serway, Clement J. Moses, Curt A. Moyer

Chapter10: Statistical Physics

Section: Chapter Questions

Problem 26P

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