Answered: Q6. If etch rates are 100nm/min for…

Q6. If etch rates are 100nm/min for silicon and 10nm/min for silicon dioxide mask, the etch selectivity should be... O 0.01 O 0.1 O 1 O 10

Principles of Instrumental Analysis

7th Edition

ISBN:9781305577213

Author:Douglas A. Skoog, F. James Holler, Stanley R. Crouch

Publisher:Douglas A. Skoog, F. James Holler, Stanley R. Crouch

Chapter23: Potentiometry

Section: Chapter Questions

Problem 23.12QAP: What arc the advantages of microfabricated ISEs? Describe typical applications of this type of...

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Question

Q6. If etch rates are 100nm/min
for silicon and 10nm/min for
silicon dioxide mask, the etch
selectivity should be...
O 0.01
O 0.1
O 1
O 10

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